磁力抛光多数以单面抛光为主，较少有双面同时有效抛光方式.本文提出了基于环形磁场励磁的磁力抛光新工艺，该方法可以同时有效抛光两个表面.通过设计能励磁环形磁场的电磁铁，并进行三维有限元仿真分析，搭建了环形磁场双面抛光装置.利用该平台进行不锈钢两面抛光工艺试验研究，探讨了电流强度、磁极与工件间间隙、主轴转速和抛光时间工艺等参数对表面粗糙度Ra的影响.得出表面粗糙度Ra随着抛光时间、工作间隙、工件转速的增大而减小.设计正交实验方案得出合理的两面磁力抛光工艺参数，并最终取得了具有良好表面粗糙度Ra的两面工件样品.试验证明，该方法可以同时对工件的两个表面进行抛光，两个表面的表面粗糙度Ra由最初0.2 μm下降到Ra(S)=0.094 μm和Ra(N)=0.068 μm.
Traditional magnetic abrasive polishing process is only suitable for processing one side of the workpiece, but it cannot polish double-surface at the same time. To overcome the shortcomings of current methods, this paper presented a new magnetic polishing process based on annular magnetic field, which can polish both sides of the workpiece simultaneously. Electromagnet with annular magnetic field was designed, and then finite element simulation analysis was carried on. In order to further explore the effect of current intensity, the clearance between the magnetic pole and the workpiece, the spindle speed and polishing time on surface roughness, double-surface polishing experiments were carried out on the material of stainless steel. It was concluded that the surface roughness Ra decreased with the increase of polishing time, working gap and spindle speed. Orthogonal test scheme was designed to obtain the reasonable process parameters and experimental verification was made. Finally, a good surface roughness on both sides was obtained. The experiment has proved that the method can polish both sides of the workpiece surface at the same time, and the surface roughness Ra of two surfaces decreases from the original 0.2 μm to Ra (S) = 0.094μm and Ra (N) = 0.068μm respectively.
阮日新,罗 虎,王永强,陈逢军,胡 天,尹韶辉.基于环形磁场励磁的两面磁力抛光试验研究[J].湖南大学学报：自然科学版,2016,43(4):31~37复制