TiO 2 films were prepared by electron beam evaporation (E -beam). X -ray diffraction (XRD), X -ray photoelectron spectroscopy (XPS) and atomic force microscope (AFM) were applied to characterize the film's structure. UV -visible spectrophotometer was used to analyze the changes of refractive index (RI). It has been found that the RI of TiO 2 film prepared by E -beam is lower than that of the bulk. It can be regulated within 1.97～2.22 by controlling O 2 pressure, deposition rate and substrate temperature. Compact film with RI within 2.06～2.42 is obtained by ion beam assisted deposition. Glancing angle deposition can realize the regulation of RI within 1.71～2.18 by controlling the growing angle and the porosity of films.